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Quencher diffusion in chemically amplified poly(4-hydroxystyrene-
<i>co</i>
-
<i>t</i>
-butyl methacrylate) resist

Quencher diffusion in chemically amplified poly(4-hydroxystyrene- co - t -butyl methacrylate) resist

Kozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro

期刊名称Japanese Journal of Applied Physics
作者Kozawa, Takahiro; Santillan, Julius Joseph; Itani, Toshiro
卷第54卷
期第11期
印刷ISSN0021-4922
电子ISSN1347-4065
文件大小744.80KB
发表时间2015-11-01
DOI10.7567/JJAP.54.118002

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