Supercritical carbon dioxide etching of transition metal (Cu, Ni, Co, Fe) thin films

• 期刊名称Microelectronic Engineering
• 作者Rasadujjaman, Md; Nakamura, Yoshiki; Watanabe, Mitsuhiro; Kondoh, Eiichi; Baklanov, Mikhail R.
• 卷第153卷
• 印刷ISSN0167-9317
• 文件大小1196.58KB
• 发表时间2016-03
• DOI10.1016/j.mee.2015.12.018
• 页码5-10