SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Design-Process-Technology Co-optimization for Manufacturability X - Layout decomposition and synthesis for a modular technology to solve the edge-placement challenges by combining selective etching, direct stitching, and alternating-material self-aligned multiple patterning processes
- 作者Capodieci, Luigi; Cain, Jason P.; Liu, Hongyi; Han, Ting; Zhou, Jun; Chen, Yijian
- 卷第9781卷
- 印刷ISSN0277-786X
- 文件大小713.23KB
- 发表时间2016
- DOI10.1117/12.2219082
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