Formation of Ni silicide from atomic layer deposited Ni
- 期刊名称Current Applied Physics
- 作者Yoon, Jaehong; Kim, Soo Hyeon; Kim, Hangil; Kim, Soo-Hyun; Kim, Hyungjun; Lee, Han-Bo-Ram
- 卷第16卷
- 期第7期
- 印刷ISSN1567-1739
- 文件大小1372.67KB
- 发表时间2016-07
- DOI10.1016/j.cap.2016.04.005
- 页码720-725
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