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Reliability aspects of copper metallization and interconnect technology for power devices

Reliability aspects of copper metallization and interconnect technology for power devices

Hille, Frank; Roth, Roman; Schäffer, Carsten; Schulze, Holger; Heuck, Nicolas; Bolowski, Daniel; Guth, Karsten; Ciliox, Alexander; Rott, Karina; Umbach, Frank; Kerber, Martin
  • 期刊名称Microelectronics Reliability
  • 作者Hille, Frank; Roth, Roman; Schäffer, Carsten; Schulze, Holger; Heuck, Nicolas; Bolowski, Daniel; Guth, Karsten; Ciliox, Alexander; Rott, Karina; Umbach, Frank; Kerber, Martin
  • 印刷ISSN0026-2714
  • 文件大小3228.18KB
  • 发表时间2016-9
  • DOI10.1016/j.microrel.2016.07.119
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