Study of alternate hardmasks for extreme ultraviolet patterning

De Silva, Anuja; Seshadri, Indira; Arceo, Abraham; Petrillo, Karen; Meli, Luciana; Mendoza, Brock; Yao, Yiping; Belyansky, Michael; Halle, Scott; Felix, Nelson M.

期刊名称Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
作者De Silva, Anuja; Seshadri, Indira; Arceo, Abraham; Petrillo, Karen; Meli, Luciana; Mendoza, Brock; Yao, Yiping; Belyansky, Michael; Halle, Scott; Felix, Nelson M.
卷第34卷
期第6期
印刷ISSN2166-2746
电子ISSN2166-2754
文件大小1425.91KB
发表时间2016-11
DOI10.1116/1.4966960

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Study of alternate hardmasks for extreme ultraviolet patterning