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Erratum: Effect of thermal annealing treatments on the optical activation of Tb
<sup>3+</sup>
-doped amorphous SiC:H thin films (2016
<i>J. Phys. D: Appl</i>
.
<b>49</b>
375104)

Erratum: Effect of thermal annealing treatments on the optical activation of Tb ³⁺ -doped amorphous SiC:H thin films (2016 J. Phys. D: Appl . 49 375104)

Guerra, J A; De Zela, F; Tucto, K; Montañez, L; Töfflinger, J A; Winnacker, A; Weingärtner, R

期刊名称Journal of Physics D: Applied Physics
作者Guerra, J A; De Zela, F; Tucto, K; Montañez, L; Töfflinger, J A; Winnacker, A; Weingärtner, R
卷第49卷
期第40期
印刷ISSN0022-3727
电子ISSN1361-6463
文件大小256.24KB
发表时间2016-10-12
DOI10.1088/0022-3727/49/40/409601

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