Deep Diffusion of Phosphorus in Silicon using Microsecond-pulsed Laser Doping
- 期刊名称Materials Science in Semiconductor Processing
- 作者Mondal, Som; Solanki, Chetan Singh
- 卷第59卷
- 印刷ISSN1369-8001
- 文件大小1483.20KB
- 发表时间2017-03
- DOI10.1016/j.mssp.2016.11.011
- 页码10-17
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