Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant
- 期刊名称Current Applied Physics
- 作者Oh, Il-Kwon; Kim, Hyungjun; Lee, Han-Bo-Ram
- 卷第17卷
- 期第3期
- 印刷ISSN1567-1739
- 文件大小908.88KB
- 发表时间2017-03
- DOI10.1016/j.cap.2016.12.021
- 页码333-338
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