Switching Kinetics in Nanoscale Hafnium Oxide Based Ferroelectric Field-Effect Transistors
Mulaosmanovic, Halid; Ocker, Johannes; Müller, Stefan; Schroeder, Uwe; Müller, Johannes; Polakowski, Patrick; Flachowsky, Stefan; van Bentum, Ralf; Mikolajick, Thomas; Slesazeck, Stefan
- 期刊名称ACS Applied Materials & Interfaces
- 作者Mulaosmanovic, Halid; Ocker, Johannes; Müller, Stefan; Schroeder, Uwe; Müller, Johannes; Polakowski, Patrick; Flachowsky, Stefan; van Bentum, Ralf; Mikolajick, Thomas; Slesazeck, Stefan
- 卷第9卷
- 期第4期
- 印刷ISSN1944-8244
- 电子ISSN1944-8252
- 文件大小1197.31KB
- 发表时间2017-02
- DOI10.1021/acsami.6b13866
- 页码3792-3798