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Characterization of the electronic structure and thermal stability of HfO
<sub/>2</sub>
/SiO
<sub/>2</sub>
/Si gate dielectric stack

Characterization of the electronic structure and thermal stability of HfO ₂ /SiO ₂ /Si gate dielectric stack

Duan, T. L.; Pan, L.; Zhang, Z.; Tok, E. S.; Pan, J. S.

期刊名称Surface and Interface Analysis
作者Duan, T. L.; Pan, L.; Zhang, Z.; Tok, E. S.; Pan, J. S.
印刷ISSN0142-2421
文件大小269.26KB
发表时间2017
DOI10.1002/sia.6222

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