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Channel Mobility in GaN Hybrid MOS-HEMT Using SiO₂ as Gate Insulator

Channel Mobility in GaN Hybrid MOS-HEMT Using SiO₂ as Gate Insulator

Fiorenza, Patrick; Greco, Giuseppe; Iucolano, Ferdinando; Patti, Alfonso; Roccaforte, Fabrizio
  • 期刊名称IEEE Transactions on Electron Devices
  • 作者Fiorenza, Patrick; Greco, Giuseppe; Iucolano, Ferdinando; Patti, Alfonso; Roccaforte, Fabrizio
  • 印刷ISSN0018-9383
  • 电子ISSN1557-9646
  • 文件大小1483.88KB
  • 发表时间2017
  • DOI10.1109/TED.2017.2699786
  • 页码1-7
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