Photo-irradiated caffeic acid exhibits antimicrobial activity against Streptococcus mutans biofilms via hydroxyl radical formation
Nakamura, Keisuke; Shirato, Midori; Kanno, Taro; Lingström, Peter; Örtengren, Ulf; Niwano, Yoshimi
- 期刊名称Scientific Reports
- 作者Nakamura, Keisuke; Shirato, Midori; Kanno, Taro; Lingström, Peter; Örtengren, Ulf; Niwano, Yoshimi
- 卷第7卷
- 期第1期
- 电子ISSN2045-2322
- 文件大小2062.98KB
- 发表时间2017-12
- DOI10.1038/s41598-017-07007-z