Local electric field direct writing – Electron-beam lithography and mechanism
- 期刊名称Microelectronic Engineering
- 作者Jiang, Nan; Su, Dong; Spence, John C.H.
- 卷第182卷
- 印刷ISSN0167-9317
- 文件大小2908.36KB
- 发表时间2017-10
- DOI10.1016/j.mee.2017.08.006
- 页码8-14
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