[IEEE 2017 IEEE 35th International Conference on Computer Design (ICCD) - Boston, MA (2017.11.5-2017.11.8)] 2017 IEEE International Conference on Computer Design (ICCD) - Post-Layout Perturbation towards Stitch Friendly Layout for Multiple E-Beam Lithography
- 作者Paul, Sudipta; Banerjee, Pritha; Sur-Kolay, Susmita
- 文件大小208.80KB
- 发表时间2017
- DOI10.1109/iccd.2017.71
- 页码411-414
[IEEE 2017 39th Annual International Conference of the IEEE Engineering in Medicine and Biology Society (EMBC) - Jeju Island, South Korea (2017.7.11-2017.7.15)] 2017 39th Annual International Conference of the IEEE Engineering in Medicine and Biology Society (EMBC) - Welcome2017
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