175 nm period grating fabricated by i-line proximity mask-aligner lithography
Bourgin, Yannick; Voigt, Daniel; Käsebier, Thomas; Siefke, Thomas; Kley, Ernst-Bernhard; Zeitner, Uwe D.
- 期刊名称Optics Letters
- 作者Bourgin, Yannick; Voigt, Daniel; Käsebier, Thomas; Siefke, Thomas; Kley, Ernst-Bernhard; Zeitner, Uwe D.
- 卷第42卷
- 期第19期
- 印刷ISSN0146-9592
- 电子ISSN1539-4794
- 文件大小1528.45KB
- 发表时间2017-10-01
- DOI10.1364/ol.42.003816