![Lithographic performance of 193 nm single and bi-layer materials.]()
Lithographic performance of 193 nm single and bi-layer materials.Goethals, A.M.; Pollers, I.; Roey, F. van; Sugihara, T.; Ronse, K.; Driessche, V. van; Tzviatkov, P.; Medina, A.; Gabor, A.; Blakeney, A.; Steinhausler, T.; Biafore, J.; Slater, S.; Nalamasu, O.; Houlihan, F.; Kometani, J.; Timko, A.; Cirelli, R. · Journal of Photopolymer Science and Technology · 1998