Ab initio
based calculations of the thermal conductivity at the micron scale
Chaput, Laurent; Larroque, Jérôme; Dollfus, Philippe; Saint-Martin, Jérôme; Lacroix, David
- 期刊名称Applied Physics Letters
- 作者Chaput, Laurent; Larroque, Jérôme; Dollfus, Philippe; Saint-Martin, Jérôme; Lacroix, David
- 卷第112卷
- 期第3期
- 印刷ISSN0003-6951
- 电子ISSN1077-3118
- 文件大小503.20KB
- 发表时间2018-01-15
- DOI10.1063/1.5010959