Plasma-assisted As implants for effective work function modulation of TiN/HfO 2 gate stacks on germanium
- 期刊名称Applied Physics Letters
- 作者Kothari, Shraddha; Vaidya, Dhirendra; Nejad, Hasan; Variam, Naushad; Ganguly, Swaroop; Lodha, Saurabh
- 卷第112卷
- 期第20期
- 印刷ISSN0003-6951
- 电子ISSN1077-3118
- 文件大小1832.14KB
- 发表时间2018-05-14
- DOI10.1063/1.5028045
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