Zirconium oxide surface passivation of crystalline silicon
- 期刊名称Applied Physics Letters
- 作者Wan, Yimao; Bullock, James; Hettick, Mark; Xu, Zhaoran; Yan, Di; Peng, Jun; Javey, Ali; Cuevas, Andres
- 卷第112卷
- 期第20期
- 印刷ISSN0003-6951
- 电子ISSN1077-3118
- 文件大小1793.03KB
- 发表时间2018-05-14
- DOI10.1063/1.5032226
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