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Engineering of a Mo/Si
<sub/><i>x</i>
</sub>
N
<sub/><i>y</i>
</sub>
Diffusion Barrier to Reduce the Formation of MoS
<sub/>2</sub>
in Cu
<sub/>2</sub>
ZnSnS
<sub/>4</sub>
Thin Film Solar Cells

Engineering of a Mo/Si _x N _y Diffusion Barrier to Reduce the Formation of MoS ₂ in Cu ₂ ZnSnS ₄ Thin Film Solar Cells

Wei, Zhengfei; Fung, Chung Man; Pockett, Adam; Dunlop, Thomas O.; McGettrick, James D.; Heard, Peter J.; Guy, Owen J.; Carnie, Matthew J.; Sullivan, James H.; Watson, Trystan M.

期刊名称ACS Applied Energy Materials
作者Wei, Zhengfei; Fung, Chung Man; Pockett, Adam; Dunlop, Thomas O.; McGettrick, James D.; Heard, Peter J.; Guy, Owen J.; Carnie, Matthew J.; Sullivan, James H.; Watson, Trystan M.
印刷ISSN2574-0962
电子ISSN2574-0962
文件大小2510.20KB
发表时间2018-06
DOI10.1021/acsaem.8b00401

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