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Strain-Compensated InGaAsP Superlattices for Defect Reduction of InP Grown on Exact-Oriented (001) Patterned Si Substrates by Metal Organic Chemical Vapor Deposition

Strain-Compensated InGaAsP Superlattices for Defect Reduction of InP Grown on Exact-Oriented (001) Patterned Si Substrates by Metal Organic Chemical Vapor Deposition

Megalini, Ludovico; Šuran Brunelli, Simone; Charles, William; Taylor, Aidan; Isaac, Brandon; Bowers, John; Klamkin, Jonathan
  • 期刊名称Materials
  • 作者Megalini, Ludovico; Šuran Brunelli, Simone; Charles, William; Taylor, Aidan; Isaac, Brandon; Bowers, John; Klamkin, Jonathan
  • 卷第11卷
  • 期第3期
  • 电子ISSN1996-1944
  • 文件大小5711.13KB
  • 发表时间2018-02-26
  • DOI10.3390/ma11030337
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