Chemically specific termination control of oxide interfaces via layer-by-layer mean inner potential engineering

Sun, H. Y.; Mao, Z. W.; Zhang, T. W.; Han, L.; Zhang, T. T.; Cai, X. B.; Guo, X.; Li, Y. F.; Zang, Y. P.; Guo, W.; Song, J. H.; Ji, D. X.; Gu, C. Y.; Tang, C.; Gu, Z. B.; Wang, N.; Zhu, Y.; Schlom, D. G.; Nie, Y. F.; Pan, X. Q.

期刊名称Nature Communications
作者Sun, H. Y.; Mao, Z. W.; Zhang, T. W.; Han, L.; Zhang, T. T.; Cai, X. B.; Guo, X.; Li, Y. F.; Zang, Y. P.; Guo, W.; Song, J. H.; Ji, D. X.; Gu, C. Y.; Tang, C.; Gu, Z. B.; Wang, N.; Zhu, Y.; Schlom, D. G.; Nie, Y. F.; Pan, X. Q.
卷第9卷
期第1期
电子ISSN2041-1723
文件大小1069.82KB
发表时间2018-12
DOI10.1038/s41467-018-04903-4

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Chemically specific termination control of oxide interfaces via layer-by-layer mean inner potential engineering