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Plasma-enhanced reactive linear sputtering source for formation of silicon-based thin films

Plasma-enhanced reactive linear sputtering source for formation of silicon-based thin films

Takenaka, Kosuke; Setsuhara, Yuichi; Han, Jeon Geon; Uchida, Giichiro; Ebe, Akinori
  • 期刊名称Review of Scientific Instruments
  • 作者Takenaka, Kosuke; Setsuhara, Yuichi; Han, Jeon Geon; Uchida, Giichiro; Ebe, Akinori
  • 卷第89卷
  • 期第8期
  • 印刷ISSN0034-6748
  • 电子ISSN1089-7623
  • 文件大小817.63KB
  • 发表时间2018-08
  • DOI10.1063/1.5037408
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