Plasma-enhanced reactive linear sputtering source for formation of silicon-based thin films
Takenaka, Kosuke; Setsuhara, Yuichi; Han, Jeon Geon; Uchida, Giichiro; Ebe, Akinori
- 期刊名称Review of Scientific Instruments
- 作者Takenaka, Kosuke; Setsuhara, Yuichi; Han, Jeon Geon; Uchida, Giichiro; Ebe, Akinori
- 卷第89卷
- 期第8期
- 印刷ISSN0034-6748
- 电子ISSN1089-7623
- 文件大小817.63KB
- 发表时间2018-08
- DOI10.1063/1.5037408