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Ion-flux characteristics during low-temperature (300°C) deposition of thermochromic VO<sub>2</sub> films using controlled reactive HiPIMS

Ion-flux characteristics during low-temperature (300°C) deposition of thermochromic VO₂ films using controlled reactive HiPIMS

Vlček, Jaroslav; Kolenatý, David; Kozak, Tomas; Houska, Jiri; Capek, Jiri; Kos, Šimon

期刊名称Journal of Physics D: Applied Physics
作者Vlček, Jaroslav; Kolenatý, David; Kozak, Tomas; Houska, Jiri; Capek, Jiri; Kos, Šimon
印刷ISSN0022-3727
电子ISSN1361-6463
文件大小1569.21KB
发表时间2018-10-19
DOI10.1088/1361-6463/aae9c6

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