Effects of ion irradiation on the structural and electrical properties of HfO2/SiON/Si p-metal oxide semiconductor capacitors

Manikanthababu, N.; Saikiran, V.; Basu, T.; Prajna, K.; Vajandar, S.; Pathak, A.P.; Panigrahi, B.K.; Osipowicz, T.; Rao, S.V.S. Nageswara

期刊名称Thin Solid Films
作者Manikanthababu, N.; Saikiran, V.; Basu, T.; Prajna, K.; Vajandar, S.; Pathak, A.P.; Panigrahi, B.K.; Osipowicz, T.; Rao, S.V.S. Nageswara
印刷ISSN0040-6090
文件大小6159.21KB
发表时间2019-3
DOI10.1016/j.tsf.2019.03.009

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