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Diffusion of hydrogen atoms in silicon layers deposited from molecular beams on dielectric substrates

Diffusion of hydrogen atoms in silicon layers deposited from molecular beams on dielectric substrates

Chizh, Kirill V.; Arapkina, Larisa V.; Stavrovsky, Dmitry B.; Gaiduk, Peter I.; Yuryev, Vladimir A.
  • 期刊名称Materials Science in Semiconductor Processing
  • 作者Chizh, Kirill V.; Arapkina, Larisa V.; Stavrovsky, Dmitry B.; Gaiduk, Peter I.; Yuryev, Vladimir A.
  • 卷第99卷
  • 印刷ISSN1369-8001
  • 文件大小1154.59KB
  • 发表时间2019-08
  • DOI10.1016/j.mssp.2019.04.014
  • 页码78-84
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