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Mist chemical vapor deposition study on a 20 nm thick undoped ferroelectric hafnium oxide film on n<sup>+</sup>-Si(100) substrate

Mist chemical vapor deposition study on a 20 nm thick undoped ferroelectric hafnium oxide film on n⁺-Si(100) substrate

Tahara, Daisuke Male; NISHINAKA, Hiroyuki; Sato, Shota; Li, Liu; Kawaharamura, Toshiyuki; YOSHIMOTO, Masahiro; Noda, Minoru

期刊名称Japanese Journal of Applied Physics
作者Tahara, Daisuke Male; NISHINAKA, Hiroyuki; Sato, Shota; Li, Liu; Kawaharamura, Toshiyuki; YOSHIMOTO, Masahiro; Noda, Minoru
印刷ISSN0021-4922
电子ISSN1347-4065
文件大小720.57KB
发表时间2019-08-06
DOI10.7567/1347-4065/ab38d8

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