[IEEE 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2019.5.6-2019.5.9)] 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Photoresist Lifting Induced Oxide Bridge Defects
- 作者Xia, Wei; Anderson, David; Lin, Felix; Cohrs, Jonathan; Paracha, Shazad; Mahato, Dip; Ellis, Eric
- 文件大小3284.57KB
- 发表时间2019
- DOI10.1109/asmc.2019.8791766
- 页码1-4
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