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Effect of Etching Time to Tune Magnetoresistance Between Positive and Negative Values in p-Type Silicon Nanowires

Effect of Etching Time to Tune Magnetoresistance Between Positive and Negative Values in p-Type Silicon Nanowires

Ben Abdelaziz, B.; Radaoui, M.; Ben Fredj, A.; Romdhane, S.; Ben Alaya, C.; Bouaïcha, M.; Bouchriha, H.
  • 期刊名称Journal of Electronic Materials
  • 作者Ben Abdelaziz, B.; Radaoui, M.; Ben Fredj, A.; Romdhane, S.; Ben Alaya, C.; Bouaïcha, M.; Bouchriha, H.
  • 印刷ISSN0361-5235
  • 电子ISSN1543-186X
  • 文件大小1687.01KB
  • 发表时间2019-9-11
  • DOI10.1007/s11664-019-07615-7
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