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Simulation of charge processes in dielectric films of MIS structures at simultaneous influence by ionization and high-field injection of electrons

Simulation of charge processes in dielectric films of MIS structures at simultaneous influence by ionization and high-field injection of electrons

Andreev, Dmitrii V.; Bondarenko, Gennady G.; Andreev, Vladimir V.; Stolyarov, Alexander A.
  • 期刊名称Procedia Manufacturing
  • 作者Andreev, Dmitrii V.; Bondarenko, Gennady G.; Andreev, Vladimir V.; Stolyarov, Alexander A.
  • 卷第37卷
  • 印刷ISSN2351-9789
  • 文件大小672.62KB
  • 发表时间2019
  • DOI10.1016/j.promfg.2019.12.048
  • 页码279-285
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