Anisotropic ion beam etching of fused silica to mitigate subsurface damage
Li, Bo; Xiang, Xia; Tian, Chengxiang; Hou, Chunyuan; Liao, Wei; Deng, Hongxiang; Jiang, Xiaolong; Wang, Haijun; Yuan, Xiaodong; Jiang, Xiaodong; Zu, Xiaotao
- 期刊名称International Journal of Modern Physics B
- 作者Li, Bo; Xiang, Xia; Tian, Chengxiang; Hou, Chunyuan; Liao, Wei; Deng, Hongxiang; Jiang, Xiaolong; Wang, Haijun; Yuan, Xiaodong; Jiang, Xiaodong; Zu, Xiaotao
- 印刷ISSN0217-9792
- 电子ISSN1793-6578
- 文件大小1442.43KB
- 发表时间2020-03-27
- DOI10.1142/S0217979220500605