Diffusion Mechanism of Phosphorus from Phosphorous Vapor in Amorphous Silicon Dioxide Film Prepared by Thermal OxidationSusa, Masahiro · Journal of The Electrochemical Society · 1997

ChemInform Abstract: EFFECT OF BACK-SIDE OXIDATION ON BORON AND PHOSPHORUS DIFFUSION IN SILICON DIRECTLY MASKED WITH SILICON NITRIDE (SI3N4) FILMSMIZUO, S.; HIGUCHI, H. · Chemischer Informationsdienst · 1983