An Improved Method of Determining Deep Impurity Levels and Profiles in Semiconductors
- 期刊名称Japanese Journal of Applied Physics
- 作者Goto, Gensuke; Yanagisawa, Shintaro; Wada, Osamu; Takanashi, Hirobumi
- 卷第13卷
- 期第7期
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小158.34KB
- 发表时间1974-7
- DOI10.1143/JJAP.13.1127
- 页码1127-1133
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