Sodium Contamination in SiO 2 Films Induced by Plasma Ashing
- 期刊名称Japanese Journal of Applied Physics
- 作者Akiya, Hideo; Saito, Kazuyuki; Kobayashi, Kenji
- 卷第20卷
- 期第3期
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小744.56KB
- 发表时间1981-3
- DOI10.1143/JJAP.20.647
- 页码647-655
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