Time-dependent-dielectric breakdown of thin thermally grown SiO2films
- 作者Yamabe, K.; Taniguchi, K.
- 卷第32卷
- 期第2期
- 印刷ISSN0018-9383
- 电子ISSN1557-9646
- 文件大小701.05KB
- 发表时间1985
- DOI10.1109/t-ed.1985.21958
- 页码423-428
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