Influence of an Insulating Film on Plasma Silicon Dioxide Deposition Rates
- 期刊名称Journal of The Electrochemical Society
- 作者Osredkar, Radko
- 卷第133卷
- 期第7期
- 印刷ISSN0013-4651
- 文件大小369.27KB
- 发表时间1986
- DOI10.1149/1.2108928
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