Novolak structures suitable for high resolution positive photoresists and application.
- 期刊名称Journal of Photopolymer Science and Technology
- 作者Furuta, A.; Hanabata, M.
- 卷第2卷
- 期第3期
- 印刷ISSN0914-9244
- 电子ISSN1349-6336
- 文件大小371.69KB
- 发表时间1989
- DOI10.2494/photopolymer.2.383
- 页码383-390
Fluorinated Polyimides for Optical Applications.Matsuura, Tohru · Journal of Photopolymer Science and Technology · 1997
Amorphous chalcogenide inorganic resist.YOSHIKAWA, AKIRA · Journal of Photopolymer Science and Technology · 1994
Photopolymerizable Polyfunctional Methacrylated Polyesters.Huang, Hong; Zhang, Jiongzheng; Shi, Wenfang · Journal of Photopolymer Science and Technology · 1997
Synthesis of Photosensitive Polycarbodiimide.Mochizuki, Amane; Takeshi, Kazumasa; Haba, Osamu; Kato, Sadao; Ueda, Mitsuru · Journal of Photopolymer Science and Technology · 1998
Optical Properties of Polyalicyclic Polyimides.Matsumoto, Toshihiko; Feger, Claudius · Journal of Photopolymer Science and Technology · 1998
Plasma Polymerization of Heteroaromatic Compounds.Iriyama, Yu · Journal of Photopolymer Science and Technology · 2001
Organic Solid-State Laser.Taniguchi, Yoshio · Journal of Photopolymer Science and Technology · 2002
Investigation of Organic PhotoconductorsKuwahara, Atsushi; Naka, Shigeki; Okada, Hiroyuki · Journal of Photopolymer Science and Technology · 2007