SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Optical/Laser Microlithography III - 0.5-μm photolithography using high-numerical-aperture I-line wafer steppers
- 作者Arnold, William H.; Minvielle, Anna Maria; Phan, Khoi A.; Singh, Bhanwar; Templeton, Michael K.; Pol, Victor
- 卷第1264卷
- 印刷ISSN0277-786X
- 文件大小1329.30KB
- 发表时间1990
- DOI10.1117/12.20184
- 页码127-142
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