Quantitative surface analysis performed with an imaging photoelectron spectrometer
- 作者Maria F. Ebel; Horst Ebel; Guido Barnegg-Golwig; Michael Mantler; Robert Svagera
- 卷第101卷
- 印刷ISSN0026-3672
- 电子ISSN1436-5073
- 文件大小363.52KB
- 发表时间1990
- DOI10.1007/bf01244159
- 页码63-69
Quantitative XPS — multiline approachWolfgang Hanke; Horst Ebel; Maria F. Ebel; Alexander Jablonski; Kichinosuke Hirokawa · 1986
Multiple ionization in quantitative XRFHorst Ebel; Robert Svagera; Maria F. Ebel · 2001
Surface analysis by TEY — Theory and applicationsHorst Ebel; Robert Svagera; Maria F. Ebel · 1997
Quantitative surface analysis performed with an imaging photoelectron spectrometerMaria F. Ebel; Horst Ebel; Guido Barnegg-Golwig; Michael Mantler; Robert Svagera · 1990
Quantitative Röntgenfluorescenzanalyse an Proben mit allgemeiner OberflächeHorst Ebel; Maria F. Ebel · 1973
Numerical description of photoelectric absorption coefficients for fundamental parameter programsHorst Ebel; Robert Svagera; Maria F. Ebel; Abdallah Shaltout; John H. Hubbell · 2003
X-ray waveguide phenomenon in thin layers under grazing incidence conditions.Horst Ebel; Robert Svagera; Maria F. Ebel · 2001
Effects of photoelectron elastic scattering on angular distribution of photoemission from solidsAlexander Jalonski; Maria F. Ebel; Horst Ebel · 1986