Control of gold concentration profiles in silicon by ion implantation
- 期刊名称Journal of Applied Physics
- 作者Coffa, S.; Calcagno, L.; Campisano, S. U.; Ferla, G.
- 卷第69卷
- 期第3期
- 印刷ISSN0021-8979
- 文件大小732.80KB
- 发表时间1991
- DOI10.1063/1.347271
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