Electrode Temperature Effect in Narrow-Gap Reactive Ion Etching
- 期刊名称Japanese Journal of Applied Physics
- 作者Tsukada, Tsutomu; Mashiro, Supika; Mashimo, Kimiko
- 卷第32卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小243.91KB
- 发表时间1993-10-15
- DOI10.1143/JJAP.32.4850
- 页码4850-4853
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