New Dry Surface-Imaging Process for X-Ray Lithography
- 期刊名称Japanese Journal of Applied Physics
- 作者Ogawa, Taro; Yamaguchi, Atsuko; Soga, Takashi; Tachibana, Hiroaki; Matsumoto, Mutsuyoshi; Oizumi, Hiroaki; Takeda, Eiji
- 卷第33卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小919.14KB
- 发表时间1994-3-15
- DOI10.1143/JJAP.33.1577
- 页码1577-1582
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