发现好书期刊，享受阅读乐趣

海量图书期刊资源，随时随地畅享阅读乐趣

$Low-Temperature Si Epitaxy by Photochemical Vapor Deposition with $bf SiH_{2}Cl_{2}$$

Low-Temperature Si Epitaxy by Photochemical Vapor Deposition with $bf SiH_{2}Cl_{2}$

Oshima, Takayuki; Alonso, Juan Carlos; Yamada, Akira; Konagai, Makoto; Takahashi, Kiyoshi

期刊名称Japanese Journal of Applied Physics
作者Oshima, Takayuki; Alonso, Juan Carlos; Yamada, Akira; Konagai, Makoto; Takahashi, Kiyoshi
卷第33卷
印刷ISSN0021-4922
文件大小656.85KB
发表时间1994-2-1
DOI10.1143/JJAP.33.L153

← 返回【学霸图书馆】主页