Symmetric InP mirror facets fabricated by selective chemical beam epitaxy on reactive-ion-etched sidewalls
- 作者M. Gotoda; H. Sugimoto; S. Maruno; T. Isu; W. Susaki; M. Nunoshita
- 卷第150卷
- 印刷ISSN0022-0248
- 文件大小445.81KB
- 发表时间1995
- DOI10.1016/0022-0248(95)80242-5
- 页码399-403
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