Influence of Oxygen and Nitrogen in the Intrinsic Layer of a-Si:H Solar Cells
- 期刊名称Japanese Journal of Applied Physics
- 作者Kinoshita, Toshihiro; Isomura, Masao; Hishikawa, Yoshihiro; Tsuda, Shinya
- 卷第35卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小208.57KB
- 发表时间1996-7-15
- DOI10.1143/JJAP.35.3819
- 页码3819-3824
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