Organosilane Monolayer Resists for Scanning Probe Lithography.
- 期刊名称Journal of Photopolymer Science and Technology
- 作者Sugimura, Hiroyuki; Nakagiri, Nobuyuki
- 卷第10卷
- 期第4期
- 印刷ISSN0914-9244
- 电子ISSN1349-6336
- 文件大小547.37KB
- 发表时间1997
- DOI10.2494/photopolymer.10.661
- 页码661-666
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