![Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111)]()
Trimethylaluminum and Oxygen Atomic Layer Deposition on Hydroxyl-Free Cu(111)Gharachorlou, Amir; Detwiler, Michael D.; Gu, Xiang-Kui; Mayr, Lukas; Klötzer, Bernhard; Greeley, Jeffrey; Reifenberger, Ronald G.; Delgass, W. Nicholas; Ribeiro, Fabio H.; Zemlyanov, Dmitry Y. · ACS Applied Materials & Interfaces · 2015