$Characterization of excimer laser annealed polycrystalline Si[sub 1âx]Ge[sub x] alloy thin films by x-ray diffraction and spectroscopic ellipsometry$

Characterization of excimer laser annealed polycrystalline Si[sub 1âx]Ge[sub x] alloy thin films by x-ray diffraction and spectroscopic ellipsometry

Yu, Guolin; Krishna, Kalaga Murali; Shao, Chunlin; Umeno, Masayoshi; Soga, Tetsuo; Watanabe, Junji; Jimbo, Takashi

期刊名称Journal of Applied Physics
作者Yu, Guolin; Krishna, Kalaga Murali; Shao, Chunlin; Umeno, Masayoshi; Soga, Tetsuo; Watanabe, Junji; Jimbo, Takashi
卷第83卷
期第1期
印刷ISSN0021-8979
文件大小401.03KB
发表时间1998
DOI10.1063/1.366670

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Characterization of excimer laser annealed polycrystalline Si[sub 1âx]Ge[sub x] alloy thin films by x-ray diffraction and spectroscopic ellipsometry

Characterization of excimer laser annealed polycrystalline Si[sub 1âx]Ge[sub x] alloy thin films by x-ray diffraction and spectroscopic ellipsometry