Substrate temperature effect on the optical and electrical properties of antimony trisulfide thin films
- 作者I.K El Zawawi; A Abdel-Moez; F.S Terra; M Mounir
- 卷第324卷
- 印刷ISSN0040-6090
- 文件大小263.43KB
- 发表时间1998
- DOI10.1016/s0040-6090(98)00350-2
- 页码300-304
Influence of substrate temperature, deposition rate, surface texture and material on the structure of uhv deposited erbium filmsHadi Savaloni; Michael A Player; Erdan Gu; Geoffrey V Marr · 1992
Influence of substrate temperature and deposition rate on the structure of erbium films deposited on glass and a-C substratesSavaloni, H.; Player, M. A.; Gu, E.; Marr, G. V. · Review of Scientific Instruments · 1992
Influence of the deposition rate on crystalline structure and cation disordering of YBCO thin filmsJeong Dae Suh, ; Gun Yong Sung, ; Kwang Yong Kang, · IEEE Transactions on Appiled Superconductivity · 1999
The Influence of Deposition Rate on the Structure and Morphology of Gold/Silicon(111) Growth by Molecular Beam EpitaxyMarconi, Daniel; Colniţă, Alia; Turcu, Ioan · Analytical Letters · 2016
The influence of the structure of amorphous silicon deposited in ultrahigh vacuum on the solid phase epitaxial growth rateI.G. Kaverina; V.V. Korobtsov; V.G. Lifshits; V.G. Zavodinskii; A.V. Zotov · 1984
Influence of deposition rate on the structural properties of plasma-enhanced CVD epitaxial siliconChen, Wanghua; Cariou, Romain; Hamon, Gwenaëlle; Léal, Ronan; Maurice, Jean-Luc; Cabarrocas, Pere Roca i · Scientific Reports · 2017
Influence of O2 flow rate on the structural properties of MgO films deposited by dual magnetron sputteringY.H. Cheng; H. Kupfer; U. Krause; T. Kopte; C. Peters; F. Richter · 2004